Plasma Etcher等离子刻蚀朹�/strong>

NPC-3500（M）等离子刻蚀朹�/strong>概述９�span>NANO-MASTER等离子灰化和清洗系统是专门设计用来满足晶圆批处理或者单晶片处理的广泛应用，从晶圆的光刻胶剥离到表面改性都涉及到。该系列的设备采�?/span>PC控制，可以配套不同的等离子源，加热或不加热基片夹其�/span>＋�/span>具有****的能劚�/span>:可以仍�/span>PE等离子刻蚀切换�?/span>RIE刻蚀模式＋�/span>也就是说可以支持各向同性和各向异性的各种应用、�/span>

NPC-3500（M）等离子刻蚀朹�/strong>产品特点

• 紧凑型立式系绞�/span>

• 不锈钢、铝制腔体或钟罩式耐热玻璃腓�/span>

• 兼容100级超净间使�?/span>

• 淋浴头�?/span>ICP或微波等离子溏�/span>

• 旋转样品�?/span>

• RF偏压�?/span>PID控制加热�?/span>300 ��C或冷却的样品�?/span>

• 全自动或手动RF调谐

• *多可支持4�?/span>MFC带电抛光的气体管�?/span>

• PC计算机控制的气动阀

• 带密码保护的多级访问控制

• 基于LabView软件皃�/span>PC计算机全自动控制

• 机械泵的压力可达�?/span>10mTorr

• 250 l/s的涡轮分子泵

• 极限真空丹�/span>5x10-7Torr

• 完整的安全联�?/span>

NPC-3000（M）等离子刻蚀朹�/strong>应用９�/span>

• 有机物以及无机物的残留物去除

• 光刻胶剥离或灰化

• 去残胶以及内腐蚀(深腐蚀)应用

• 清洗微电子元件，电路板上的钻孔或铜线框架

• 提高黏附性，消除键合问题

• 塑料的表面改型：O2处理以改进涂覆性能

• 产生亲水或疏水表靡�/span>

NPC-3000（M）等离子刻蚀朹�/strong>Features９�/span>

• Stand Alone System

• Stainless Steel� Aluminum or Bell Jar Chambers

• Class 100 Clean Room Compatible

• Shower Head� ICP or Microwave Plasma Sources

• Rotating Platen

• RF Biasable Heated up to 300 ��C PID Controlled or Cooled Platen

• Fully Automated or Manual RF tuning

• Up to 4 Mass Flow Controllers with Electropolished Gas Lines

• PC Controlled Pneumatic Valves

• Multiple Levels of Access with Password Protection

• PC Controlled with LabVIEW

• Mechanical Pump with Pressure goes to 10 mTorr

• 250 l/sec Turbomolecular Pump

• 5x10-7 Torr Base Pressure

• Fully Safety Interlocked

NPC-3500（M）等离子刻蚀朹�/strong>Applications:

• Removal of Organic and Inorganic Materials without Residues

• Photoresist Stripping or Ashing

• Desmearing and Etch Back Applications

• Cleaning Microelectronics� Drilled Holes on Circuit Boards or Cu Lead Frames

• Adhesion Promotion� Elimination of Bonding Problems

• urface Modification of Plastics: O2 Treatment for Paintability

• Producing Hydrophilic or Hydrophobic Surfaces